| 摘要 |
PROBLEM TO BE SOLVED: To solve such a problem that a high-performance optical filter can not be formed in a short time by conventional method. SOLUTION: A vapor deposition method and an ion beam sputtering method are adopted at a time so as to form a film in which a structure of low denseness is formed by the vapor deposition method and vacancies of this structure are filled with a structure of high denseness formed by the ion beam sputtering method. Or, only the ion beam sputtering method is adopted just after starting deposition and just before completing the deposition so as to form layers of high denseness on the interfaces of the film.
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