发明名称 DEVICE FOR INSPECTING DEFECT
摘要 PROBLEM TO BE SOLVED: To highly precisely detect both a foreign matter and a scratch by a single device, mainly in inspection of an inspected substrate with a pattern. SOLUTION: This inspection device is provided with a lighting system of which the an optical axis of a beam serving as an S polarization with respect to an inspection face of the inspected object is set to make an illumination angle, that is a angle formed by the inspected object and the inspection face, brought into 2-20 deg., the first photoreception system set to make a differential angle to the optical axis of the beam brought into 140-160 deg., and set to make a photoreception angle, that is an angle fromed with respect to the inspection face, brought into 25-55 deg., the second photoreception system set to make the differential angle to the optical axis of the beam brought into -140--160 deg., and set to make the photoreception angle, that is the angle fromed with respect to the inspection face, brought into 25-55 deg., and the third photoreception system set to make the differential angle to the optical axis of the beam brought into substantially 0 deg., set to make the photoreception angle, that is the angle formed with respect to the inspection face, brought into 20-50 deg., and set to make a component serving as a P polarization passed through.
申请公布号 JP2002257747(A) 申请公布日期 2002.09.11
申请号 JP20010051788 申请日期 2001.02.27
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 NAGASAKI TATSUO;NOMURA TAKESHI;MASE KENICHIRO;NAKAJIMA SHINYA
分类号 G01B11/30;G01N21/956;(IPC1-7):G01N21/956 主分类号 G01B11/30
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