发明名称 Stage system and exposure apparatus
摘要 A stage system includes a movable stage, a position measuring device for measuring the position of the stage, a velocity sensor for detecting the velocity of the stage, and a control unit having a position feedback loop based on an output of the position measuring device and a feedback loop for applying a damping to the stage on the basis of an output of the velocity sensor. With the addition of the feedback loop for applying the damping to the stage by using an output of the velocity sensor, a strong braking function is provided, such that the positioning settlement time can be shortened.
申请公布号 US6448723(B1) 申请公布日期 2002.09.10
申请号 US20000645611 申请日期 2000.08.25
申请人 CANON KABUSHIKI KAISHA 发明人 WAKUI SHINJI
分类号 H01L21/027;G03F7/20;G05D3/12;H02K41/00;(IPC1-7):H02K41/00 主分类号 H01L21/027
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