发明名称 |
APPARATUS AND METHOD FOR DEVICE-PROCESSING OF POSITIVE PRESSURE WITH TWO PARTITIONS TO MINIMIZE LEAKAGE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for effectively flowing a fluid in a device having a lumen during cleaning, disinfecting or sterilizing. SOLUTION: The apparatus for device-processing of a positive pressure with two partitions to minimize a leakage comprises two boundary regions and two fluid supply sources. The method for device-processing comprises the step of flowing the fluid into the two adjacent compartments. Thus, the loss of the fluid due to a gap can be reduced or eliminated. |
申请公布号 |
JP2002253645(A) |
申请公布日期 |
2002.09.10 |
申请号 |
JP20010305619 |
申请日期 |
2001.10.01 |
申请人 |
ETHICON INC |
发明人 |
LIN SZU-MIN;AGAMOHAMADI MITCH |
分类号 |
B08B3/02;A61L2/02;A61L2/18;A61L2/20;A61L2/22;B08B3/04;B08B9/02 |
主分类号 |
B08B3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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