发明名称 APPARATUS AND METHOD FOR DEVICE-PROCESSING OF POSITIVE PRESSURE WITH TWO PARTITIONS TO MINIMIZE LEAKAGE
摘要 PROBLEM TO BE SOLVED: To provide a method and an apparatus for effectively flowing a fluid in a device having a lumen during cleaning, disinfecting or sterilizing. SOLUTION: The apparatus for device-processing of a positive pressure with two partitions to minimize a leakage comprises two boundary regions and two fluid supply sources. The method for device-processing comprises the step of flowing the fluid into the two adjacent compartments. Thus, the loss of the fluid due to a gap can be reduced or eliminated.
申请公布号 JP2002253645(A) 申请公布日期 2002.09.10
申请号 JP20010305619 申请日期 2001.10.01
申请人 ETHICON INC 发明人 LIN SZU-MIN;AGAMOHAMADI MITCH
分类号 B08B3/02;A61L2/02;A61L2/18;A61L2/20;A61L2/22;B08B3/04;B08B9/02 主分类号 B08B3/02
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