| 摘要 |
PURPOSE: A plasma etching apparatus for manufacturing a semiconductor device is provided to be capable of maintaining stably the pressure in a reaction chamber. CONSTITUTION: A plasma etching apparatus includes a reaction chamber(20), a pump(23), a valve driver(24), a pressure control system part(25), a data storing part(26), a wavelength detector(27), and a switch part(29). The pressure control system part(25) measures the pressure in the reaction chamber, outputs control signals of the valve driver through the first output terminal(25-1) and outputs a valve open value to the second output terminal(25-2). The switch part(29) connects an input terminal(24-2) of the valve driver to the first output terminal or the data storing part.
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