发明名称 |
MULTILAYER WIRING STRUCTURE, ITS MANUFACTURING METHOD, ELECTRONIC CIRCUIT DEVICE, AND ELECTRONIC PART |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a multilayer wiring structure using an interlayer connecting method by which the manufacturing process of a multilayer wiring board can be shortened, the amount of a chemical use that is considered to be high in effect or the environment can be reduced, and sufficient connecting strength is obtained, and to provide a method of manufacturing the structure, an electronic circuit device, and an electronic part. SOLUTION: The multilayer wiring structure is constituted by alternately laminating two pieces 2 and 4 of metal foil and an insulating layer 3 and electrically connecting the two pieces 2 and 4 of metal foil to each other through a non-through via hole 7. The hole 7 contains scattered metallic particles 9 in its internal wall section. The two pieces 2 and 4 of metal foil and scattered metallic particles 9 are of the same metal, and made of copper.</p> |
申请公布号 |
JP2002252464(A) |
申请公布日期 |
2002.09.06 |
申请号 |
JP20010049720 |
申请日期 |
2001.02.26 |
申请人 |
HITACHI LTD;HITACHI VIA MECHANICS LTD |
发明人 |
HASEBE TAKEHIKO;SHIGI HIDETAKA;YAMAGUCHI YOSHIHIDE;KITAMURA NAOYA;ARAI KUNIO;KATO TERUTAKE |
分类号 |
B23K26/00;B23K26/38;B23K101/42;H05K3/00;H05K3/46;(IPC1-7):H05K3/46 |
主分类号 |
B23K26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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