METHOD AND SYSTEM FOR PROCESSING WORK WITH VAPOR

摘要

PROBLEM TO BE SOLVED: To remove organic matters, e.g. resist, existing on the surface of a work easily and surely by using vapor. SOLUTION: Unsaturated vapor 15 having a temperature higher than 100 deg.C and a vapor pressure lower than saturated vapor pressure is generated by heating cleaning liquid 13 and jetted from a nozzle 6 toward a low temperature work 4 in a processing chamber 2 in order to wet processing the work 4 by condensing a part of the unsaturated vapor 15 on the work surface. On the other hand, the work 4 is heated with the heat of the unsaturated vapor 15 and then dried by evaporating the condensed cleaning liquid.