发明名称 ANTI-REFLECTIVE COATING MATERIAL, SEMICONDUCTOR PRODUCT WITH AN ARC LAYER AND METHODS
摘要 The invention refers to an anti-reflective coating (ARC) layer (2) covering a semiconductor substrate, the ARC layer being made of a matrix substance (3) and of nanocrystalline particles (4) of another material than the matrix substance. According to the invention the nanocrystalline particles (4) are absorbing light via the quantum size effect. Thereby a new kind of ARC layer, in particular absorbing ARC layer, is provided.
申请公布号 WO02069045(A2) 申请公布日期 2002.09.06
申请号 WO2002EP01506 申请日期 2002.02.13
申请人 INFINEON TECHNOLOGIES SC300 GMBH & CO. KG;HORNIG, STEFFEN;GANZ, DIETMAR 发明人 HORNIG, STEFFEN;GANZ, DIETMAR
分类号 G03F7/11;G02B1/11;G03F7/004;G03F7/09;H01L21/027 主分类号 G03F7/11
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