发明名称 ELECTRON BEAM TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an electron beam treatment device that can exactly measure only the quantity of electron beams emitted from electron beam tubes. SOLUTION: In an electron beam treatment device which has electron beam quantity detection components 2 that detect the quantity of the electron beams emitted from the electron beam tubes 1 with the electron emission windows 11 outside them, connection lines 3 which transmit detection signals detected by the electron beam quantity detection components 2 are insulated and coated so as not to be affected at least by the electron beams and the plasma generated by them.
申请公布号 JP2002250799(A) 申请公布日期 2002.09.06
申请号 JP20010049357 申请日期 2001.02.23
申请人 USHIO INC 发明人 YAMAGUCHI MASANORI;MURASE ATSUSHI
分类号 G21K5/04;G03F7/20;H01L21/027;(IPC1-7):G21K5/04 主分类号 G21K5/04
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