发明名称 |
ELECTRON BEAM TREATMENT DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam treatment device that can exactly measure only the quantity of electron beams emitted from electron beam tubes. SOLUTION: In an electron beam treatment device which has electron beam quantity detection components 2 that detect the quantity of the electron beams emitted from the electron beam tubes 1 with the electron emission windows 11 outside them, connection lines 3 which transmit detection signals detected by the electron beam quantity detection components 2 are insulated and coated so as not to be affected at least by the electron beams and the plasma generated by them.
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申请公布号 |
JP2002250799(A) |
申请公布日期 |
2002.09.06 |
申请号 |
JP20010049357 |
申请日期 |
2001.02.23 |
申请人 |
USHIO INC |
发明人 |
YAMAGUCHI MASANORI;MURASE ATSUSHI |
分类号 |
G21K5/04;G03F7/20;H01L21/027;(IPC1-7):G21K5/04 |
主分类号 |
G21K5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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