| 摘要 |
<p>A method and apparatus for imaging an overlying pattern over an underlying pattern on a substrate, by determining deviations between the actual locations and the nominal locations of predetermined reference targets in the underlying pattern on the substrate; and utilizing the determined deviations for modifying the scanning control data used for imaging the image data of the overlying pattern in order to reduce misregistration thereof with respect to the underlying pattern. Preferably, the reference targets are predetermined connection sites in the underlying pattern to be precisely located with respect to connection sites in the overlying pattern. The reference features may be assigned different weights according to their registration importance, and the deviations may be determined according to a threshold, which varies with the weight assigned to the respective reference feature.</p> |
