发明名称 THIN-FILM TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide a thin-film transistor which is not affected by a crystal grain boundary, has a high breakdown voltage and can use a large current without changing its characteristics. SOLUTION: In a channel-forming region of the thin-film transistor, there is no crystal grain boundary, carbon and nitrogen are contained at a concentration of 1×10<16> -5×10<18> cm<-3> , oxygen is contained at a concentration of 1×10<17> -5×10<19> cm<-3> , spin density is 1×10<15> -1×10<17> cm<-3> , hydrogen or halogen is contained at a concentration of 1×10<15> -1×10<20> cm<-3> , and mobility of hydrogen or halogen is 500-1,000 Vs/cm<2> .
申请公布号 JP2002252355(A) 申请公布日期 2002.09.06
申请号 JP20010398381 申请日期 2001.12.27
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI;TERAMOTO SATOSHI
分类号 H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L29/786 主分类号 H01L21/20
代理机构 代理人
主权项
地址