SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus that can suppress the transferring of particles onto a wafer by preventing the dissolution of organic solvent steam into pure water. SOLUTION: Nitrogen gas is jetted out of a second supply nozzle 50 in a horizontal direction and nitrogen gas flow covering the surface of pure water stored in the processing tank 20 is formed. Isopropyl alcohol(IPA) steam is jetted out of the first supply nozzle 40 upward and atmosphere including IPA steam is formed at the upper part of the processing tank 20. A substrate W lifted upward out of the processing tank 20 by a lifting equipment, is dried by moving through the nitrogen gas flow and reaching atmosphere including IPA steam. Since the IPA steam from the first supply nozzle 40 is not jetted directly toward pure water and the contact of atmosphere including the IPA steam with pure water is prevented by the nitrogen gas flow, dissolution of the IPA steam into pure water can be prevented and the transferring of particles onto a wafer caused by the dissolution of the IPA steam can be suppressed.