发明名称 SURFACE TREATMENT METHOD FOR ORNAMENT, AND THE ORNAMENT
摘要 PROBLEM TO BE SOLVED: To provide an ornament which has an excellent aesthetic appearance, and a surface treatment method for the ornament. SOLUTION: The surface treatment method contains stages (3a, 3b) where a first substrate 41 is formed at least on a part of the surface of a base material 2; a stage (3c) where a second substrate 42 is formed thereon; a stage (3d) where a third substrate 43 is formed thereon; and a stage (3e) where a covering layer 3 consisting of a stainless steel is formed at least on a part of the third substrate 43 by a dry plating method. The second substrate 42 is a buffer layer relaxing the potential difference between the first substrate 41 and the third substrate 43. The average thickness of the covering layer 3 is preferably 0.5 to 2.5μm.
申请公布号 JP2002249887(A) 申请公布日期 2002.09.06
申请号 JP20010267920 申请日期 2001.09.04
申请人 SEIKO EPSON CORP 发明人 TSUKAMOTO WATARU;KAWAHARA KIMIKAZU
分类号 B22F3/02;C23C14/02;C23C14/14;C23C14/16;C23C14/18;C23C14/20;C23C28/00;C23C28/02;(IPC1-7):C23C28/02 主分类号 B22F3/02
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