CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a chemical amplification type resist composition excellent in transmittance to light of <=170 nm wavelength and suitable particularly for F2 excimer laser lithography. SOLUTION: The chemical amplification type resist composition contains a radiation sensitive acid generating agent which generates an acid when exposed with radiation of <=170 nm and a binder resin which is alkali-soluble or undergoes a chemical change by the action of the radiation sensitive acid generating agent after irradiation with radiation and becomes alkali-soluble and has a polymerization unit in which a linking group is an ether bond.