发明名称 MULTI-LAYER FILM CUT FILTER AND PRODUCTION METHOD THEREFOR, UV CUT FILTER, DUSTPROOF GLASS, DISPLAY PANEL AND PROJECTION TYPE DISPLAY UNIT
摘要 A multi-layer film, wherein a ratio H/L or L/H, a balance in optical film thickness between a high-refractive-index layer H and a low-refractive-index layer L, is set within a range of 1.2-2.0 to bias a balance in thickness. A method of producing a dielectric multi-layer film, wherein, when a dielectric multi-layer film is formed, a proportion at which an optical film thickness is formed on a monitor substrate is made larger than usual. A UV reflection film, having a step difference in average transmittance of 70-90% at a specified half wavelength and within a wavelength range of 430-450 nm, is provided on a substrate to form a UV cut filter. A UV reflection film at a specified half wavelength, a step difference in average transmittance of 70-90% within a wavelength range of 430-450 nm, and a blue conditioning film having a transmittance of at least 90% within a wavelength range of 460-520 nm may be combined. This UV cut filter is applied to the projection type display unit of a ultra-high pressure mercury lamp light source. The UV reflection film may be provided on the dustproof glass of a display unit.
申请公布号 WO02069000(A1) 申请公布日期 2002.09.06
申请号 WO2002JP01457 申请日期 2002.02.20
申请人 SEIKO EPSON CORPORATION;YANO, KUNIHIKO;UCHIDANI, TAKAHIRO 发明人 YANO, KUNIHIKO;UCHIDANI, TAKAHIRO
分类号 G02B5/20;G02B5/28;(IPC1-7):G02B5/28;G03B21/00;C23C14/54 主分类号 G02B5/20
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