发明名称 |
Multiple wavelength photolithography for preparing multilayer microstructures |
摘要 |
The invention relates to a multilayer microstructure and a method for preparing thereof. The method involves first applying a first photodefinable composition having a first exposure wavelength on a substrate to form a first polymeric layer. A portion of the first photodefinable composition is then exposed to electromagnetic radiation of the first exposure wavelength to form a first pattern in the first polymeric layer. After exposing the first polymeric layer, a second photodefinable composition having a second exposure wavelength is applied on the first polymeric layer to form a second polymeric layer. A portion of the second photodefinable composition is then exposed to electromagnetic radiation of the second exposure wavelength to form a second pattern in the second polymeric layer. In addition, a portion of each layer is removed according to the patterns to form a multilayer microstructure having a cavity having a shape that corresponds to the portions removed.
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申请公布号 |
US2002122918(A1) |
申请公布日期 |
2002.09.05 |
申请号 |
US20010799744 |
申请日期 |
2001.03.05 |
申请人 |
DENTINGER PAUL MICHAEL;KRAFCIK KAREN LEE |
发明人 |
DENTINGER PAUL MICHAEL;KRAFCIK KAREN LEE |
分类号 |
B81C99/00;C25D1/00;G03F7/00;G03F7/095;(IPC1-7):B32B3/10;G03C3/00;G03C5/00 |
主分类号 |
B81C99/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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