发明名称 Device for examining contact state of films, method of examining contact state of films, and film for examination
摘要 The present invention is to easily examine the contact state of two piled films in a short time. In the present invention, light from a light source 13 is radiated from a base material side of a test negative 71 under the condition where a mat surface 70B having a light scattering property of a test film 70 faces and contacts a sensitized surface 71B having a stripe pattern 72 recorded thereon of a test negative 71, the image of the stripe pattern irradiated with the transparent light which goes through the test negative 71 and the test film 70 in order is photographed from the surface 70A side of the test film 70, and the image of the photographed stripe pattern 72 is displayed, thereby the user can visually recognize that the test negative 71 and the test film 70 are in an optimal contact state at this time when the image of the stripe pattern 72 is clearly displayed and on the other hand, the user can visually recognize that the test negative 71 and the test film 70 have space between them and are in the non-contact state, not in the contact state, at this time when the image of the stripe pattern 72 is unclearly displayed.
申请公布号 US2002122166(A1) 申请公布日期 2002.09.05
申请号 US20020086796 申请日期 2002.02.27
申请人 SONY CORPORATION 发明人 SAITO ETSURO
分类号 G03B27/08;(IPC1-7):G03B27/02 主分类号 G03B27/08
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