发明名称 Alternate method for photodiode formation in CMOS image sensors
摘要 A complementary metal oxide semiconductor (CMOS) active pixel sensor (APS) having a plurality of pixels which includes at least one pixel entailing a photodetector, a transistor adjacent the photodetector having a silicide surface, and an insulator over the photodetector. The insulator has a thickness sufficient to prevent the silicide surface from forming over the photodetector and contains an insulator as a field oxide.
申请公布号 US2002121656(A1) 申请公布日期 2002.09.05
申请号 US20000750941 申请日期 2000.12.29
申请人 EASTMAN KODAK COMPANY 发明人 GUIDASH ROBERT M.
分类号 H01L21/8234;H01L27/146;(IPC1-7):H01L31/062;H01L31/113;H01L21/00;H01L21/823 主分类号 H01L21/8234
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