| 摘要 |
A pattern inspection device comprises a section for obtaining a sensor data by imaging a pattern formed on an object to be inspected, a reference data creation section to create a reference data obtained from a design data of the pattern, a pattern recognition section for cutting out a predetermined area from the reference data and recognizing the pattern, and a level conversion section for converting a level of one of the reference data and the sensor data according to a recognition result in the pattern recognition section. |
