发明名称 |
MANUFACTURING METHOD OF SPACER FOR ELECTRON-BEAM APPARATUS AND MANUFACTURING METHOD OF ELECTRON-BEAM APPARATUS |
摘要 |
There is herein disclosed a manufacturing method of a spacer for an electron-beam apparatus which comprises an airtight container, and an electron source. The spacer is arranged in the airtight container. The method comprises the step of heating and drawing a base material of the spacer to form a desired rough state on the surface of the base material, the step of heating and drawing the base material of the spacer to form the desired rough state and an electroconductive film on the surface of the base material, or the step of heating and drawing the base material of the spacer having the rough state on its surface. According to the present invention, the spacer having a surface structure on which can suppress charging can be manufactured at a low cost, and an electron-beam apparatus such as an image-forming apparatus having a sufficient display luminance can also be manufactured.
|
申请公布号 |
US2002123292(A1) |
申请公布日期 |
2002.09.05 |
申请号 |
US20000512265 |
申请日期 |
2000.02.24 |
申请人 |
YAMAZAKI KOJI;ITO NOBUHIRO;FUSHIMI MASAHIRO |
发明人 |
YAMAZAKI KOJI;ITO NOBUHIRO;FUSHIMI MASAHIRO |
分类号 |
C03B23/047;H01J9/18;H01J9/24;H01J29/02;H01J29/86;H01J29/87;H01J31/12;(IPC1-7):H01J9/24 |
主分类号 |
C03B23/047 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|