发明名称 Process for conductive lines in a conductor plane in a semiconductor element forms two contacting lines one above the other
摘要 Conductive leads (1-4) are formed in a conductive plane on a substrate by structuring a conductive layer, covering with an isolation layer, forming openings to the conductive layer and forming and structuring a second conductive layer like the first and in electrical contact with it to divide current flow between the layers. An Independent claim is also included for a semiconductor element having conductive lines as above.
申请公布号 DE10106729(A1) 申请公布日期 2002.09.05
申请号 DE2001106729 申请日期 2001.02.14
申请人 INFINEON TECHNOLOGIES AG 发明人 UNERTL, MARCUS
分类号 H01L21/768;H01L23/528;(IPC1-7):H01L21/768 主分类号 H01L21/768
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