METHOD FOR FABRICATING SILICON WAFER FOR OPTICAL FIBER BLOCK ARRAY HAVING V-GROOVE

摘要

PURPOSE: A method for fabricating a silicon wafer for optical fiber block array having a V-groove is provided to prevent an etching phenomenon of a lower side of a silicon wafer in a V-groove forming process by forming a mask layer and a photoresist layer on a lower face of the silicon wafer. CONSTITUTION: An upper mask layer(51a) and a lower mask layer(51b) are formed on a silicon wafer(50). An upper photoresist layer is formed on the upper mask layer(51a). A photoresist pattern is formed on the upper photoresist layer(53) and an upper mask pattern(53a) is formed by performing a developing process. A lower photoresist layer(53b) is formed on the lower mask layer(51b)(140). A mask for etching a V-groove is formed on the upper mask layer(51a)(150). The upper and the lower photoresist layers(53a,53b) are removed(S160). The V-groove is formed on the silicon wafer(50)(S170). The V-groove is completed by removing the upper and the lower mask layers(51a,51b)(S180).