发明名称 |
APPLICATION METHOD OF TWO-SHOT SHOTCRETE |
摘要 |
PURPOSE: An application method of two-shot shotcrete is provided to minimize a rebound rate of wet-type shotcrete mortar. CONSTITUTION: The application method of two-shot shotcrete comprises the steps of: applying B-type shotcrete mortar composed of cement, fine aggregate, water and accelerator to construct a B-type shotcrete mortar layer of adhesive coarse aggregate to a thickness of 10 millimeters on the wall of a tunnel; applying A-type shotcrete mortar composed of cement, coarse aggregate, fine aggregate, water and accelerator to construct an A-type shotcrete mortar layer to a thickness of 40 millimeters; and repeating above steps twice.
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申请公布号 |
KR20020069389(A) |
申请公布日期 |
2002.09.04 |
申请号 |
KR20010009623 |
申请日期 |
2001.02.26 |
申请人 |
KOREA INSTITUTE OF CONSTRUCTION TECHNOLOGY |
发明人 |
BAE, GYU JIN;MA, SANG JUN |
分类号 |
E21D11/00;(IPC1-7):E21D11/00 |
主分类号 |
E21D11/00 |
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