发明名称 APPLICATION METHOD OF TWO-SHOT SHOTCRETE
摘要 PURPOSE: An application method of two-shot shotcrete is provided to minimize a rebound rate of wet-type shotcrete mortar. CONSTITUTION: The application method of two-shot shotcrete comprises the steps of: applying B-type shotcrete mortar composed of cement, fine aggregate, water and accelerator to construct a B-type shotcrete mortar layer of adhesive coarse aggregate to a thickness of 10 millimeters on the wall of a tunnel; applying A-type shotcrete mortar composed of cement, coarse aggregate, fine aggregate, water and accelerator to construct an A-type shotcrete mortar layer to a thickness of 40 millimeters; and repeating above steps twice.
申请公布号 KR20020069389(A) 申请公布日期 2002.09.04
申请号 KR20010009623 申请日期 2001.02.26
申请人 KOREA INSTITUTE OF CONSTRUCTION TECHNOLOGY 发明人 BAE, GYU JIN;MA, SANG JUN
分类号 E21D11/00;(IPC1-7):E21D11/00 主分类号 E21D11/00
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