发明名称 |
Gas distribution plate |
摘要 |
An apparatus for use in a substrate processing system. The apparatus is generally a fluid distribution plate comprising an inner disk and an outer ring. The fluid distribution plate has a plurality of openings for fluid distribution and at least one slot defined therein.
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申请公布号 |
US6444040(B1) |
申请公布日期 |
2002.09.03 |
申请号 |
US20000565150 |
申请日期 |
2000.05.05 |
申请人 |
APPLIED MATERIALS INC. |
发明人 |
HERCHEN HARALD;PALAGASHVILI DAVID;LUBOMIRSKY DMITRY;SCHREIBER ALEX |
分类号 |
C23C16/44;C23C16/455;H01L21/00;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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