发明名称 Motion feed-through into a vacuum chamber and its application in lithographic projection apparatuses
摘要 A long-stroke movement is fed-through into a vacuum chamber by providing a sliding seal over an aperture in the vacuum chamber wall. The object to be moved, which may be a mask or wafer table in a lithographic apparatus, within the vacuum chamber is connected to or mounted on the sliding seal and moved by movement of the sliding seal. The sliding seal may be a plate, a bowl or a labyrinth of interleaved plates.
申请公布号 US6445440(B1) 申请公布日期 2002.09.03
申请号 US20000551229 申请日期 2000.04.17
申请人 ASML NETHERLANDS B.V. 发明人 BISSCHOPS THEODORUS H. J.;VIJFVINKEL JAKOB;SOEMERS HERMANUS M. J. R.;DRIESSEN JOHANNES C.;RENKENS MICHAEL J. M.;BOUWER ADRIANUS G.
分类号 G03F7/20;H01L21/027;(IPC1-7):G03B27/42;G03B27/58;G03B27/62 主分类号 G03F7/20
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