发明名称 |
Fabricating electrical metal fuses without additional masking |
摘要 |
A method of forming an electrical metal fuse comprising the following steps. A substrate is provided. A first patterned dielectric layer is formed over the substrate. The first patterned dielectric layer having at least one first opening exposing at least a portion of the substrate. A first planarized structure is formed within the at least one first opening. A second patterned dielectric layer is formed over the first planarized structure. The second patterned dielectric layer having a second opening exposing at least a portion of the first planarized structure. A second planarized structure is formed within the second opening whereby the first planarized structure and the second planarized structure comprise the electrical metal fuse. The electrical metal fuse having a middle portion, having a thickness and a width, between two end portions each having a thickness and a width. The thickness and width of the middle portion being less than the respective thickness and width of the end portions.
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申请公布号 |
US6444503(B1) |
申请公布日期 |
2002.09.03 |
申请号 |
US20020068922 |
申请日期 |
2002.02.07 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY |
发明人 |
YU TA-LEE |
分类号 |
H01L21/306;H01L23/525;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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