发明名称 Fabricating electrical metal fuses without additional masking
摘要 A method of forming an electrical metal fuse comprising the following steps. A substrate is provided. A first patterned dielectric layer is formed over the substrate. The first patterned dielectric layer having at least one first opening exposing at least a portion of the substrate. A first planarized structure is formed within the at least one first opening. A second patterned dielectric layer is formed over the first planarized structure. The second patterned dielectric layer having a second opening exposing at least a portion of the first planarized structure. A second planarized structure is formed within the second opening whereby the first planarized structure and the second planarized structure comprise the electrical metal fuse. The electrical metal fuse having a middle portion, having a thickness and a width, between two end portions each having a thickness and a width. The thickness and width of the middle portion being less than the respective thickness and width of the end portions.
申请公布号 US6444503(B1) 申请公布日期 2002.09.03
申请号 US20020068922 申请日期 2002.02.07
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY 发明人 YU TA-LEE
分类号 H01L21/306;H01L23/525;(IPC1-7):H01L21/306 主分类号 H01L21/306
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