发明名称 Synthetic silica glass and its manufacturing method
摘要 A method is provided for manufacturing a synthetic silica glass. The method includes the steps of maintaining a silica glass member, which is formed using a flame hydrolysis method and having an OH group concentration of about 500 ppm to about 1300 ppm, at a predetermined holding temperature for a predetermined period of time so as to substantially relax the structure of the silica glass member. The method further includes the step of subsequently cooling the silica glass member to a first predetermined temperature at a cooling rate of about 10 K/hour or less, and thereafter, cooling the silica glass member to a second predetermined temperature at a cooling rate of about 1 K/hour or less. The method further includes the step of further cooling the silica glass member to a third predetermined temperature at a cooling rate of about 10 K/hour or less.
申请公布号 US6442973(B1) 申请公布日期 2002.09.03
申请号 US19990235409 申请日期 1999.01.22
申请人 NIKON CORPORATION 发明人 KOMINE NORIO;FUJIWARA SEISHI;YOSHIDA AKIKO;JINBO HIROKI
分类号 C03B19/14;C03C3/06;C03C4/00;G03F7/20;(IPC1-7):C03B19/06 主分类号 C03B19/14
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