发明名称 Cleaning apparatus for removing residues
摘要 A cleaning apparatus for removing residues from the bottoms outflow of an evaporation apparatus which produces tops product and bottoms product and is equipped with an outflow, comprising:a) an outflow vessel (7),b) a collection vessel (8),c) an outflow valve, (10),d) a cleaning water valve (11),e) a vessel outflow valve (12),f) a cleaning outflow valve (13),g) a vent valve (14),h) a line (17) leading from the bottom to the outflow valve (10),i) a cleaning agent introduction tube (3),j) an outflow line device (6, 16) andconnection lines between the devices a) to j).The cleaning apparatus can be used in the workup of salt-containing solutions by distillation.
申请公布号 US6443170(B1) 申请公布日期 2002.09.03
申请号 US19990451858 申请日期 1999.12.01
申请人 BASF AKTIENGESELLSCHAFT 发明人 VANSANT FRANS;DE HERT JOZEF;KOEFFER DIETER;THEIS GERHARD;TERJUNG WINFRIED
分类号 B01D1/22;B08B3/08;B08B9/08;(IPC1-7):B08B9/08 主分类号 B01D1/22
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