EVACUATION EQUIPMENT, PARTICLE BEAM EQUIPMENT, OPTICAL RAY EQUIPMENT AND X-RAY EQUIPMENT AS WELL AS METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE USING THESE

摘要

PROBLEM TO BE SOLVED: To provide an evacuation equipment which suppresses the release of impurity gas from the inner peripheral surface and structures of a chamber 29 of the evacuation equipment and improves the vacuum degree in the chamber while maintaining a high vacuum, an optical ray equipment, a particle beam equipment, an exposure equipment and an X-ray equipment as well as to manufacture a semiconductor integrated circuit device which makes element dimensions finer by stably performing observation, etc., with high accuracy by using these equipments described above. SOLUTION: The evacuation equipment which has a vessel and evacuation means 28 in the vessel and is formed with a thin film of a platinum metal 12 on the inner. The equipment, more specifically, the particle beam equipment which has a particle beam source, a particle beam vessel having a lens to narrow down the particle beam and evacuation means of the particle beam vessel and housing vessel and performs >=1 of observing, working, drawing and inspecting of a workpiece 18 by irradiation with the particle beam, in which the thin films of the platinum metal are formed on at least one inner peripheral surface of at least either of the particle beam vessel and the housing vessel.