发明名称 SUBSTRATE WITH THIN LINE, MANUFACTURING METHOD THEREOF, ELECTRON SOURCE SUBSTRATE AND IMAGE DISPLAY DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To suppress end peeling peculiar to the formation of a thin line by an exposure and development method. SOLUTION: In a substrate with thin lines, the thin lines are formed by a thin line forming process including a step of irradiating light, from above the substrate, to a given region in a photosensitive material applied onto the substrate and a developing step subsequent to the light irradiating step, the thin lines have a narrow portion at a longitudinal end thereof, and the narrow portion has a smaller width shape than a portion adjacent to the narrow portion.</p>
申请公布号 JP2002245947(A) 申请公布日期 2002.08.30
申请号 JP20010356554 申请日期 2001.11.21
申请人 CANON INC 发明人 UDA YOSHIKI;ISHIWATARI KAZUYA;WATABE YASUYUKI;KUBO SHINSAKU
分类号 H01J1/316;H01J9/02;H01J29/04;H01J31/12;H05K1/09;H05K3/02;(IPC1-7):H01J29/04 主分类号 H01J1/316
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