发明名称 |
SUBSTRATE WITH THIN LINE, MANUFACTURING METHOD THEREOF, ELECTRON SOURCE SUBSTRATE AND IMAGE DISPLAY DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To suppress end peeling peculiar to the formation of a thin line by an exposure and development method. SOLUTION: In a substrate with thin lines, the thin lines are formed by a thin line forming process including a step of irradiating light, from above the substrate, to a given region in a photosensitive material applied onto the substrate and a developing step subsequent to the light irradiating step, the thin lines have a narrow portion at a longitudinal end thereof, and the narrow portion has a smaller width shape than a portion adjacent to the narrow portion.</p> |
申请公布号 |
JP2002245947(A) |
申请公布日期 |
2002.08.30 |
申请号 |
JP20010356554 |
申请日期 |
2001.11.21 |
申请人 |
CANON INC |
发明人 |
UDA YOSHIKI;ISHIWATARI KAZUYA;WATABE YASUYUKI;KUBO SHINSAKU |
分类号 |
H01J1/316;H01J9/02;H01J29/04;H01J31/12;H05K1/09;H05K3/02;(IPC1-7):H01J29/04 |
主分类号 |
H01J1/316 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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