发明名称 |
METHOD FOR EVALUATING IMAGING PERFORMANCE OF CHARGED PARTICLE BEAM EXPOSURE APPARATUS AND CHARGED PARTICLE BEAM EXPOSURE APPARATUS |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for evaluating an imaging performance of a charged particle beam exposure apparatus having an advantage capable of accurately measuring a distribution of a beam blur at many measuring positions in a sub-field and the charged particle beam exposure apparatus capable of being applied by the method. SOLUTION: A beam limiting opening 5 is disposed under a knife edge-like reference mark 1. An opening diameter of the limiting opening 5 is 50μm or less (preferably about 10μm). A distance (h) between the opening 5 and the reference mark 1 is a size slightly larger than a converging angle of a rectangular beam EB1 at a projection lens 15 of a lower stage at an expecting angle of an opening edge 5a from the mark 1. Most of a forward scattering electron e2 of the measuring beam EB1 and a forward scattering electron e2' of a dummy beam EB2 are shielded. Accordingly, almost only non-scattering electron e1 is detected by an electron detector 5 under the opening 5.</p> |
申请公布号 |
JP2002246298(A) |
申请公布日期 |
2002.08.30 |
申请号 |
JP20010043195 |
申请日期 |
2001.02.20 |
申请人 |
NIKON CORP |
发明人 |
YAHIRO TAKEHISA |
分类号 |
G03F1/44;G03F7/20;G03F7/22;G03F9/02;H01J37/09;H01J37/305;H01L21/027;(IPC1-7):H01L21/027;G03F1/08 |
主分类号 |
G03F1/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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