| 摘要 |
PROBLEM TO BE SOLVED: To provide a system and method for separating and recovering waste liquid by which a photoresist waste liquid can be recovered completely, without contaminating product substrate and the separating and recovering efficiency of a photoresist can be improved, without lowering the recovery of the waste photoresist liquid by preventing drying of the liquid. SOLUTION: The system has a first cup 11, which is arranged around a substrate 21 and receives the photoresist waste liquid scattered from the substrate 21, a photoresist waste liquid groove 19 which stores the photoresist waste liquid, and an exhausting means which generates an exhaust flow 24 that guides the photoresist waste liquid scattered from the substrate 21 to the groove 19. |
