| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem in the prior art measurement of pattern matching that the measuring point is varied to cause a measurement error when the waveform of a box mark is asymmetric or not smooth and the problem that reproducibility of measurement is low because there is a possibility that the measuring point may not be constant. SOLUTION: In the measurement of pattern matching for measuring the relative position of two box marks using a waveform obtained by taking in the images of first and second box marks and performing signal processing, peak values of a pair of waveforms corresponding to the level difference on the opposite sides of each box mark are compared, a higher waveform is copied onto a lower waveform, measuring points are determined on the higher waveform and the copied waveform and positional shift of the pattern is measured. |
