| 摘要 |
PROBLEM TO BE SOLVED: To accurately form patterns in the case where one pattern is split and the split patterns are subjected to scan exposure on a wafer. SOLUTION: A wafer 6 and a mask are simultaneously controlled for scan projection and exposure for transferring a pattern on the mask serving as negative onto the wafer 6 serving as photosensitive substrate using exposure light such as excimer laser beam. Each of split patterns (1), (2) is scanned for exposure by any means in the identical direction mutually at each pattern 11, when the specified pattern 11 split to small patterns (1), (2),... is connected as collective shots for exposure. |
