RESIN COMPOSITION FOR ALKALI DEVELOPABLE RESIST, DRY FILM AND RESIST COMPRISING THEIR CURED BODY

摘要

PROBLEM TO BE SOLVED: To provide a resin composition for an alkali developable resist excellent in heat, printing and wear resistances while retaining sensitivity and resolution and capable of exhibiting superior dielectric property and to provide a dry film and a resist comprising their cured body. SOLUTION: The resin composition contains a copolymer (A) consisting of repeating structural units of formula (1) and repeating structural units having an acid group and a polymerizable monomer (B). In the formula, X1 is a 3-8C branched alkyl or substituted branched alkyl or a 4-8C cycloalkyl or substituted cycloalkyl and Y1 a 3-8C branched alkyl or substituted branched alkyl or a 4-8C cycloalkyl or substituted cycloalkyl.