发明名称 MOLYBDENUM-TUNGSTEN ALLOY THIN-FILM WIRING AND ITS MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a liquid crystal display device and an EL display device, using a TFT array of high image quality and high reliability. SOLUTION: The concentration of W in a MoW film of a gate electrode is controlled in the direction of film thickness for significantly improving BT resistance, and as a result, a TFT array of high reliability is realized.</p>
申请公布号 JP2002246389(A) 申请公布日期 2002.08.30
申请号 JP20010038047 申请日期 2001.02.15
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 KAWAKITA TETSUO
分类号 G02F1/1368;G09F9/30;H01L21/28;H01L21/285;H01L21/3205;H01L23/52;H01L29/786;(IPC1-7):H01L21/320;G02F1/136 主分类号 G02F1/1368
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