| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a structure of an in-layer micro lens which improves insufficient sensitivity of a CMOS photosensor. SOLUTION: After a light shielding film is formed, a resist patterning is performed to form an opening part. The light shielding film is patterned by dry-etching, and an interlayer insulating film just below it is dry-etched up to just above a photoelectric conversion element to form a non-through hole. Then, the resist is removed, and the hole is filled with a material having a refractive index higher than the interlayer insulating film and flattened. A color filter layer is formed over it, thus a color filter layer is provided.
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