发明名称 DEVICE FABRICATING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a device fabricating system in which the operational cost is reduced, the time elapsing before a gas impeding the work has a low concentration is shortened and the maintenance time is shortened. SOLUTION: The device fabricating system comprises means for supplying mixture gas (ozone, nitrogen, and the like) to the projection optical system 5 in the device fabricating system including a pump section 10, an ozone generator 12, an ozone generating lamp 11 and piping 14a, 14b, means for varying the flow rate of the mixture gas depending on the operating state of an aligner, and/or mean for varying the compositional ratio of the mixture gas including an system control section 8, a mixture gas control section 9 and a lamp power supply section 7.
申请公布号 JP2002246283(A) 申请公布日期 2002.08.30
申请号 JP20010036666 申请日期 2001.02.14
申请人 CANON INC 发明人 NAKAMURA HAJIME
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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