| 摘要 |
PROBLEM TO BE SOLVED: To provide liquid treatment equipment and a liquid treatment method which can put the inside of a chamber in a cleaned state in advance, when liquid treatment of a substrate is started. SOLUTION: Cleaning treatment equipment as one embodiment of the liquid treatment equipment is provided with a rotor which can hold a plurality of wafers at prescribed intervals, an outside chamber 71a, an inside chamber 71b which is installed slidably between a treatment position and a retreat position, and cleaning mechanism 90 which cleans the inside chamber at the retreat position. The cleaning mechanism 90 is provided with a cylindrical body 91, which is installed inside the inside chamber, so as to form an almost cylindrical cleaning treatment chamber 72 to the inside chamber 71b, a treatment liquid jetting nozzle 55 for supplying specified cleaning liquid to a space of the chamber 72, and a gas discharge nozzle 93 for supplying a specified gas for drying to the chamber 72, thereby enabling cleaning and drying of the inside chamber 71b.
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