发明名称 Method for fabricating a non-volatile semiconductor memory cell with a separate tunnel window
摘要 A method for producing a non-volatile semiconductor memory cell with a separate tunnel window cell includes the step of forming a tunnel zone in a late implantation step by performing a tunnel implantation with the aid of a tunnel window cell as a mask. The resulting memory cell has a small area requirement and a high number of program/clear cycles.
申请公布号 US2002119626(A1) 申请公布日期 2002.08.29
申请号 US20010033949 申请日期 2001.12.28
申请人 WAWER PETER;SPRINGMANN OLIVER;WOLF KONRAD;HEITZSCH OLAF;HUCKELS KAI;RENNEKAMP REINHOLD;ROHRICH MAYK;VON KAMIENSKI ELARD STEIN;KUTTER CHRISTOPH;LUDWIG CHRISTOPH 发明人 WAWER PETER;SPRINGMANN OLIVER;WOLF KONRAD;HEITZSCH OLAF;HUCKELS KAI;RENNEKAMP REINHOLD;ROHRICH MAYK;VON KAMIENSKI ELARD STEIN;KUTTER CHRISTOPH;LUDWIG CHRISTOPH
分类号 H01L21/8247;H01L21/336;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/336 主分类号 H01L21/8247
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