POLISHING APPARATUS AND DRESSING METHOD

摘要

The apparatus for polishing a substrate while pressing the substrate into sliding contact with the fixed abrasive, comprises: a light source (32) for dressing the fixed abrasive by light irradiation; and a device (41) for supplying a chemical agent or a chemical liquid for promoting the self-generation of abrasive particles in the dressing by light irradiation. The supply of a chemical agent or a chemical liquid onto the surface of fixed abrasive can promote or maintain dressing effect attained by the light irradiation. The chemical agent or the chemical liquid to be supplied preferably contains boron, particularly preferably a borate.