ETHYLENIC FLUOROMONOMER CONTAINING HYDROXYL OR FLUOROALKYLCARBONYL GROUP AND FLUOROPOLYMER OBTAINED BY POLYMERIZING THE SAME

摘要

An ethylenic fluoromonomer containing a hydroxyl or fluoroalkylcarbonyl group which is represented by the formula (1) (1) or formula (14) (14) (wherein X<1> and X<2> are the same or different and each is hydrogen or fluorine; X<3> is hydrogen, fluorine, chlorine, or CF3; Rf<1> and Rf<2> are the same or different and each is C1-20 perfluoroalkyl; Rf<3> is C1-40 fluoroalkylene or fluoroalkylene which has an ether bond and 1 to 100 carbon atoms and in which the total number of carbon and oxygen atoms is 2 or larger; and a is 0 or 1); a fluoropolymer having structural units derived from the monomer; and a composition for photoresists. The monomer has satisfactory polymerizability, especially radical polymerizability. The polymer obtained by polymerizing the monomer has excellent optical properties and is useful as a base polymer for antireflection films or resist compositions.