| 摘要 |
Measurement of the permittivity of thin films is facilitated through the use of a short cylindrical metal cavity containing parallel plates between which a specimen to be measured is placed. The use of such parallel plates contained within such a cavity is particularly advantageous when swept frequency measurement methods utilizing frequency ranges from 0 to 20 GHz are employed. A test fixture which is preferred for use in providing such a cavity is disclosed as are methods of using the test fixture.
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