发明名称 |
PROCESS FOR PRODUCING PERFLUOROCARBONS AND USE THEREOF |
摘要 |
The process for producing perfluorocarbons according to the present invention is characterized in that in the production of a perfluorocarbon by contacting an organic compound with a fluorine gas, the organic compound is contacted with the fluorine gas at a temperature of from 200 to 500 DEG C and the content of an oxygen gas within the reaction system is controlled to 2% by volume or less based on the gas components in the reaction starting material, whereby a perfluorocarbon reduced in the content of impurities is produced.According to the process for producing perfluorocarbons of the present invention, high-purity perfluorocarbons extremely suppressed in the production of impurities such as oxygen-containing compound can be obtained. The perfluorocarbons obtained by the production process of the present invention contain substantially no oxygen-containing compound and therefore, can be effectively used as an etching or cleaning gas for use in the process for producing a semiconductor device. |
申请公布号 |
WO02066408(A2) |
申请公布日期 |
2002.08.29 |
申请号 |
WO2002JP01549 |
申请日期 |
2002.02.21 |
申请人 |
SHOWA DENKO K.K.;OHNO, HIROMOTO;OHI, TOSHIO |
发明人 |
OHNO, HIROMOTO;OHI, TOSHIO |
分类号 |
C07C17/10;C07C17/21;C07C19/08;C23G5/028;H01L21/311;H01L21/3213 |
主分类号 |
C07C17/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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