发明名称 PROCESS FOR PRODUCING PERFLUOROCARBONS AND USE THEREOF
摘要 The process for producing perfluorocarbons according to the present invention is characterized in that in the production of a perfluorocarbon by contacting an organic compound with a fluorine gas, the organic compound is contacted with the fluorine gas at a temperature of from 200 to 500 DEG C and the content of an oxygen gas within the reaction system is controlled to 2% by volume or less based on the gas components in the reaction starting material, whereby a perfluorocarbon reduced in the content of impurities is produced.According to the process for producing perfluorocarbons of the present invention, high-purity perfluorocarbons extremely suppressed in the production of impurities such as oxygen-containing compound can be obtained. The perfluorocarbons obtained by the production process of the present invention contain substantially no oxygen-containing compound and therefore, can be effectively used as an etching or cleaning gas for use in the process for producing a semiconductor device.
申请公布号 WO02066408(A2) 申请公布日期 2002.08.29
申请号 WO2002JP01549 申请日期 2002.02.21
申请人 SHOWA DENKO K.K.;OHNO, HIROMOTO;OHI, TOSHIO 发明人 OHNO, HIROMOTO;OHI, TOSHIO
分类号 C07C17/10;C07C17/21;C07C19/08;C23G5/028;H01L21/311;H01L21/3213 主分类号 C07C17/10
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