ADAPTIVE SAMPLING METHOD FOR IMPROVED CONTROL IN SEMICONDUCTOR MANUFACTURING

摘要

A method is provided, the method comprising sampling (110) at least one parameter characteristic of processing performed on a workpiece in at least one processing step (105), and modeling the at least one characteristic parameter sampled using an adaptive sampling processing model (130), treating sampling as an integrated part of a dynamic control environment, varying the sampling based upon at least one of situational information, upstream events and requirements of run-to-run controllers. The method also comprises applying the adaptive sampling processing model (130) to modify (135, 155, 160) the processing performed in the at least one processing step (105).