| 发明名称 |
PLASMA PROCESSING SYSTEM |
| 摘要 |
Among members constituting a plasma etching system, plasma resistant members, e.g. an exhaust ring (12), an insulation ring (13), and first and second bellows covers (14, 15), are formed of yttrium fluoride (YF3) in order to enhance durability.
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| 申请公布号 |
WO02067311(A1) |
申请公布日期 |
2002.08.29 |
| 申请号 |
WO2002JP01526 |
申请日期 |
2002.02.21 |
| 申请人 |
TOKYO ELECTRON LIMITED;NAGAYAMA, NOBUYUKI;MITSUHASHI, KOUJI;NAKAYAMA, HIROYUKI |
发明人 |
NAGAYAMA, NOBUYUKI;MITSUHASHI, KOUJI;NAKAYAMA, HIROYUKI |
| 分类号 |
C23C4/04;H01J37/32;H01L21/302;H01L21/3065;(IPC1-7):H01L21/306 |
主分类号 |
C23C4/04 |
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