APPARATUS AND METHOD FOR VACUUM PROCESSING

摘要

PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus and a method therefor for cleaning the inside of exhaust piping easily without requiring a large-scale work and for forming deposited films of extremely excellent quality with sufficient productivity. SOLUTION: In the vacuum processing apparatus provided with a means to exhaust the inside of a reaction vessel through exhaust piping, a deposition- preventing member and plasma leakage prevention member attachable to and detachable from the exhaust piping is provided inside the exhaust piping.