发明名称 APPARATUS AND METHOD FOR CONTROLLING PRESSURE OF PROCESS CHAMBER
摘要 PURPOSE: An apparatus and a method for controlling a pressure of a process chamber are provided to reduce a maintenance cost by using a low-priced process chamber. CONSTITUTION: A pressure value of a process chamber is detected by a vacuum sensor(401). The detected pressure value is transmitted to a pressure controller(403). The pressure controller compares the detected pressure value with a predetermined pressure value(405). The pressure of the process chamber is reduced by increasing a rotating speed of a process pump if the predetermined pressure value is smaller than the detected pressure value(407,409). The pressure controller checks whether the predetermined pressure value is equal to the detected pressure value, or not if the predetermined pressure value is higher than the detected pressure value(411). The rotating speed of the process pump is maintained if the predetermined pressure value is equal to the detected pressure value(413). The rotating speed of the process pump is reduced if the predetermined pressure value is not equal to the detected pressure value(415).
申请公布号 KR20020068770(A) 申请公布日期 2002.08.28
申请号 KR20010009032 申请日期 2001.02.22
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HUH, CHEOL
分类号 H01L21/00;(IPC1-7):H01L21/00 主分类号 H01L21/00
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