APPARATUS FOR DETECTING PARTICLES AND EXPOSURE APPARATUS

摘要

PURPOSE: An apparatus for detecting particles and an exposure apparatus are provided to detect particles on a wafer stage within a short time. CONSTITUTION: A light source(201) is formed with a light emitting diode. The light source(201) emits light to a light irradiation region of a wafer stage(205) in order to detect particles on the wafer stage(205). An area of the light irradiation region is controlled by a collimator lens(203). The collimator lens(203) is used for changing the light emitted from the light source(201) to parallel light. The light reflected from the light irradiation region is transmitted a photo sensor(209) through a condenser lens(207). The photo sensor(209) is formed with a semiconductor device. A decision portion(211) is used for checking particles of the light irradiation region. A display portion(213) is formed with a CRT or an LCD.