WAFER STAGE AND BAKE APPARATUS USING THE SAME

摘要

PURPOSE: A wafer stage and a bake apparatus using the same are provided to load a wafer on a center portion of a stage by controlling a position of the wafer. CONSTITUTION: A bake apparatus has a wafer stage(120). A process chamber(110) and a wafer are loaded on the wafer stage(120). The wafer stage(120) has a heating plate(122), a lift pin, and 4 wafer guides(126). The wafer is loaded on the heating plate(122). The lift pin is used for loading the wafer from a robot on the heating plate(122). The wafer guides(126) are used for guiding the wafer to a correct position of the heating plate(122). The wafer guides(126) are installed at an edge portion of the heating plate(122). The wafer guide(126) is formed by a band wire(126a) having an incline plane of 45 degrees. Both end portions of the band wire(126a) is combined with grooves of the heating plate(122).